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Vacuum tube furnace

TF1200 Vacuum tube furnace

1200 ℃ tube furnace is used in sintering and high temperature heat treatment of metal materials, ceramic materials, nano materials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific research instit

Date：2023-05-22Model：TF1200Visits：1659
TF1400 Vacuum tube furnace

1400 ℃ tube furnace is used in sintering and high temperature heat treatment of metal materials, ceramic materials, nano materials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific research instit

Date：2023-05-22Model：TF1400Visits：1432
TF1700 Vacuum tube furnace

1700℃ single-zone tube furnace is used in sintering and high temperature heat treatment of metal materials, ceramic materials, nano materials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific rese

Date：2023-05-22Model：TF1700Visits：2397
TF1200 ℃ CVD Tube Furnace

1200°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo

Date：2023-05-23Model：TF1200 CVDVisits：1510
TF1400 ℃ CVD Tube Furnace

1400°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo

Date：2023-05-23Model：TF1400 ℃ CVDVisits：1430
TF1700 ℃ CVD Tube Furnace

1700°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo

Date：2023-05-23Model：TF1700 ℃ CVDVisits：1474

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